Diamond Deposition Using a Grid Filament
نویسندگان
چکیده
A grid tantahun filament of a dimension of 3 X 4 cm2 was used for diamond synthesis by hotfilament assisted chemical vapour deposition (HFCVD). After proper carburization, the filament could be used for multi-cycles of deposition. By heating the filament to 2400 OC in 8% CH4 mixed with H2. diamond has been deposited at rate of about 5 p / h o u r on (100) oriented silicon substrate placed 5 mm away from the filament. By X-ray diffraction (XRD), the stn~cture of the films deposited in the mixture of CH4 and H2 was characterized as diamond, while tantalum oxide was fotmd in the presence of oxygen during deposition. The deposited diamond appeared uniform over an area of 2 X 3 an2 observed by scanning electron miaoscopy (SEM) perhaps due to the stable filament geometry. Raman spectra of these films showed a sharp peak near 1332 cm-l, which indicated the presence of a large amo~mt of sp3 bonds in the film. The present grid filament can be scaled-up for large area diamond deposition.
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تاریخ انتشار 2016